Butyl acetate 3D ball

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MOQ : 2 Containers

Butyl acetate 3D ball Trade Information

Minimum Order Quantity
2 Containers

Supply Ability
200 Containers Per Month

Delivery Time
2 Week

About Butyl acetate 3D ball

N-Butyl Acetate

Product Description

Our n-butyl acetate solvent is being offered for negative photoresist formulations. Solvent systems are necessary in the process for spin coating photosensitive (photoresist) materials evenly onto a silicon wafer. This coating process is followed by drying and pattern development by lithographic processes. The multilayered patterns form integrated circuits on the semiconductor chips.

High-purity (low trace metals) specifications are required for the solvents to make acceptable semiconductor chips, and special handling and storage procedures are used to maintain the high-purity specifications. Also, special analytical tests are used to measure selected critical trace metals in parts-per-billion levels.

Applications:

The most common use of Normal Butyl Acetate is as a solvent in the production of lacquers and paints. Its other major use is in the production of adhesives and hardened coatings. Normal Butyl Acetate is also used in the pharmaceutical industry as a solvent or an extraction agent. Its minor uses include cosmetic products, fragrance solvent in perfumes, as an anti-corrosive agent, in cleaning and car care products.

Test Description	Test results		Unit of measure	Test method
	Minimum	maximum
Appearance	Clear	Liquid		Visual
Purity	99.2		% Wt.	GC
N-butanol content		0.5	% Wt.	GC
Color		10	PT/CO	ASTM D1209
Water Content		0.05	%Wt.	ASTM D1364
Density @ 200 C	0.880	0.883		ASTM D4052
Acidity and acetic acid		0.005	% Wt.	ASTM D1045
Distillation
IBP	124			ASTM D1078
DB		128		ASTM D1078
Residue on evaporation		0.002	% Wt.	ASTM D1353